Solid state imaging device

ABSTRACT

A solid state imaging device  1  includes a photodetecting section  10 , a signal readout section  20 , a controlling section  30 , and a correction processing section  40 . In the photodetecting section  10 , M×N pixel portions each including a photodiode which generates charges as much as an incident light intensity and a readout switch connected to the photodiode are two-dimensionally arrayed in M rows and N columns. Charges generated in each pixel portion P m,n  are input into an integration circuit S n , through a readout wiring L O,n , and a voltage value output corresponding to the charge amount from the integration circuit S n  is output to an output wiring L out  through a holding circuit H n . In the correction processing section  40 , correction processing is performed for frame data repeatedly output from the signal readout section  20 , and frame data after being subjected to the correction processing is output.

TECHNICAL FIELD

The present invention relates to a solid state imaging device.

BACKGROUND ART

Solid state imaging devices using the CMOS technique are known, and among these, a passive pixel sensor (PPS) type is known (refer to Patent Document 1). The PPS type solid state imaging device includes PPS type pixel portions including photodiodes for generating charges as much as incident light intensities, two-dimensionally arrayed in M rows and N columns, and charges generated in the photodiode in each pixel portion according to light incidence are accumulated in a capacitive element in an integration circuit, and a voltage corresponding to the accumulated charge amount is output.

Generally, output terminals of M pixel portions of each column are connected to an input terminal of an integration circuit provided corresponding to the column via a readout wiring provided corresponding to the column. Charges generated in the photodiodes of the pixel portions of the respective rows are input into corresponding integration circuits through corresponding readout wirings in order from the first row to the M-th row, and voltage values corresponding to the amounts of charges are output from the integration circuits.

The PPS type solid state imaging device is used for various purposes, and is combined with, for example, a scintillator panel and used as an X-ray flat panel for medical purposes and industrial purposes, and in detail, it is also used in an X-ray CT apparatus and a microfocus X-ray examination apparatus, etc. The solid state imaging device to be used for these purposes has a large-area photodetecting section in which M×N pixel portions are two-dimensionally arrayed, and may be integrated on a semiconductor substrate having a large size with sides more than 10 centimeters. Therefore, only one solid state imaging device may be produced from one semiconductor wafer.

Patent Document 1: Japanese Published Unexamined Patent Application No. 2006-234557

DISCLOSURE OF THE INVENTION Problem to be Solved by the Invention

In the solid state imaging device described above, when a readout wiring corresponding to any of the columns is broken during production, pixel portions closer to the integration circuit than the broken point among the M pixel portions of the column are connected to the integration circuit by the readout wiring, however, pixel portions farther from the integration circuit than the broken point are not connected to the integration circuit. Therefore, charges generated in the photodiodes according to light incidence in the pixel portions farther from the integration circuit than the broken point are not read out to the integration circuit, and are just accumulated in a junction capacitance portion of the corresponding photodiode.

When the amount of charges accumulated in the junction capacitance portion of the photodiode exceeds a saturation level, charges over the saturation level overflow to the neighboring pixel portions. Therefore, when one readout wiring is broken, this influences not only the pixel portions of the column connected to this readout wiring but also pixel portions of neighboring columns on both sides of the column in question, and eventually, defective lines occur with pixel portions of three consecutive columns.

When defective lines are not consecutive and the neighboring lines of one defective line are normal, pixel data of the defective line can be interpolated by using pixel data of the normal neighboring lines. However, when defective lines occur with pixel portions in three consecutive columns, the above-described interpolation is difficult. Particularly, in a solid state imaging device including a large-area photodetecting section as described above, the probability that a wire is broken increases due to the long length of the readout wirings.

Patent Document 1 proposes an invention intended to solve this problem. In this invention, an average of all pixel data of a neighboring line neighboring a defective line is obtained, and an average of all pixel data of further neighboring several normal lines is also obtained, and when a difference between these two averages is not less than a predetermined value, the neighboring line is also determined as defective, and the pixel data of the neighboring line is corrected, and based on values after being corrected of the pixel data of the neighboring line, the pixel data of the defective line is corrected.

In the invention described in Patent Document 1, when correcting pixel data of a neighboring line determined as defective, an average of two pixel data on normal lines on both sides and nearest the neighboring line is obtained, and this average is defined as pixel data of the neighboring line. When correcting pixel data of a defective line, an average of two pixel data on neighboring lines on both sides of the defective line is obtained, and this average is defined as pixel data of the defective line.

However, in the invention described in Patent Document 1, to correct pixel data of a defective line (and a line which is near the defective line and determined as defective), processing for obtaining an average of two pixel data is repeated a plurality of times, so that the resolution lowers near the defective line in an image after being corrected.

The present invention was made for solving the above-described problem, and an object thereof is to provide a solid state imaging device capable of obtaining an image with high resolution by correcting pixel data when any of the readout wirings is broken.

Means for Solving the Problem

A solid state imaging device of the present invention includes: (1) a photodetecting section including M×N pixel portions P_(1,1) to P_(M,N) two-dimensionally arrayed in M rows and N columns, each including a photodiode which generates charges as much as incident light intensity and a readout switch which is connected to the photodiode; (2) a readout wiring L_(O,n) which is connected to readout switches included in M pixel portions P_(1,n) to P_(M,n) of the n-th column in the photodetecting section and reads out charges generated in a photodiode included in any of the M pixel portions P_(1,n) to P_(M,n) via the readout switch included in the pixel portion; (3) a signal readout section which is connected to the readout wirings L_(O,1) to L_(O,N), holds voltage values corresponding to the amounts of charges input through the readout wirings L_(O,n), and successively outputs the held voltage values; (4) a controlling section which controls opening and closing operations of readout switches included in N pixel portions P_(m,1) to P_(m,N) of the m-th row in the photodetecting section, controls voltage value output operations in the signal readout section, and makes the signal readout section repeatedly output voltage values corresponding to the amounts of charges generated in the photodiodes included in the M×N pixel portions P_(1,1) to P_(M,N) in the photodetecting section as frame data. M and N are integers not less than 2, m is integers not less than 1 and not more than M, and n is integers not less than 1 and not more than N.

The solid state imaging device of the present invention further includes, in addition to the photodetecting section, the readout wiring L_(O,n), the signal readout section, and the controlling section, a correction processing section which acquires respective frame data repeatedly output from the signal readout section and applies correction processing thereto. A frame data correction method of the present invention is a method for correcting frame data output from the solid state imaging device including the photodetecting section, the readout wiring L_(O,n), the signal readout section, and the controlling section.

When any readout wiring L_(O,n1) of the n1-th column among the readout wirings L_(O,1) to L_(O,N) is broken, the correction processing section included in the solid state imaging device of the present invention or the frame data correction method of the present invention: (a) defines a pixel portion which is not connected to the signal readout section due to the breakage of the readout wiring L_(O,n1) as a pixel portion P_(m1,n1) among M pixel portions P_(1,n1) to P_(M,n1) of the n1-th column, and defines a pixel portion neighboring the pixel portion P_(m1,n1) in the n2-th column neighboring the n1-th column as a pixel portion P_(m1,n2); (b) corrects a voltage value corresponding to the pixel portion P_(m1,n2) in frame data output from the signal readout section by converting the voltage value according to a relational expression containing the voltage value as an input variable; and (c) determines a voltage value corresponding to the pixel portion P_(m1,n1) in the frame data based on the value after being corrected of the voltage value corresponding to the pixel portion P_(m1,n2). Here, m1 is an integer not less than 1 and not more than M, and n1 and n2 are integers not less than 1 and not more than N.

According to the present invention, when any readout wiring L_(O,n1) of the n1-th column among readout wirings L_(O,1) to L_(O,N) is broken, a pixel portion which is not connected to the signal readout section due to the breakage of the readout wiring L_(O,n1) among M pixel portions P_(1,n1) to P_(M,n1) of the n1-th column is defined as a pixel portion P_(m1,n2), and a pixel portion neighboring the pixel portion P_(m1,n1) in the n2-th column neighboring the n1-th column is defined as a pixel portion P_(m1,n2). Then, a voltage value corresponding to the pixel portion P_(m1,n2) in frame data output from the signal readout section is corrected by being converted according to a relational expression containing the voltage value as an input variable. Thereafter, the voltage value corresponding to the pixel portion P_(m1,n1) in the frame data is determined based on the value after being corrected of the voltage value corresponding to the pixel portion P_(m1,n2).

Thus, when correcting the voltage value V_(k) corresponding to the pixel portion P_(m1,n2) on the readout wiring L_(O,n2) of the n2-th column neighboring the broken readout wiring L_(O,n1) of the n1-th column, it is not necessary to use a voltage value corresponding to the pixel portion on a normal line. Therefore, in the present invention, the resolution near a defective line in an image after being corrected becomes higher than in the invention described in Patent Document 1.

Preferably, the correction processing section included in the solid state imaging device of the present invention or the frame data correction method of the present invention uses a polynomial as a functional expression, and uses values determined based on incident light intensity dependencies of voltage values corresponding to a pixel portion which is neither the pixel portion P_(m1,n1) nor the pixel portion P_(m1,n2) and incident light intensity dependencies of voltage values corresponding to the pixel portion P_(m1,n2), as coefficients of the polynomial.

Preferably, the correction processing section included in the solid state imaging device of the present invention or the frame data correction method of the present invention corrects a voltage value corresponding to a pixel portion P_(m1,n2) in frame data by setting the coefficients for each of any plurality of readout wirings among the readout wirings L_(O,1) to L_(O,N) when the plurality of readout wirings are broken.

In a case where the solid state imaging device includes a plurality of pairs of photodetecting sections and signal readout sections, preferably, when a readout wiring of any of the columns included in any of the plurality of photodetecting sections is broken, the correction processing section included in the solid state imaging device of the present invention or the frame data correction method of the present invention uses coefficients obtained based on incident light intensity dependencies of voltage values corresponding to a pixel portion which is neither a pixel portion P_(m1,n1) nor a pixel portion P_(m1,n2) included in the photodetecting section and incident light intensity dependencies of voltage values corresponding to the pixel portion P_(m1,n2). The correction coefficients are set in advance based on incident light dependencies of voltage outputs of “normal pixel” and “neighboring pixel” measured in an inspection before use of the product.

An X-ray CT device of the present invention includes: (1) an X-ray output section which outputs X-rays toward a subject; (2) the solid state imaging device described above of the present invention which receives and images X-rays output from the X-ray output section and reaching through the subject; (3) a moving means for moving the X-ray output section and the solid state imaging device relative to the subject; and (4) an image analysis section which inputs frame data after being corrected, output from the solid state imaging device, and generates a tomographic image of the subject based on the frame data.

Effect of the Invention

According to the present invention, when any readout wiring is broken, an image with high resolution can be obtained by correcting pixel data.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a schematic configuration view of a solid state imaging device 1 of the present embodiment;

FIG. 2 is a circuit diagram of a pixel portion P_(m,n), an integration circuit S_(n), and a holding circuit H_(n) included in the solid state imaging device 1 of the present embodiment;

FIG. 3 is a timing chart describing operations of the solid state imaging device 1 of the present embodiment;

FIG. 4 is a diagram showing the relationship between voltage values corresponding to pixel portions of a normal line and a neighboring line in frame data output from a signal readout section 20;

FIG. 5 is a configuration view of a solid state imaging device 2 of another embodiment; and

FIG. 6 is a configuration view of an X-ray CT device 100 of the present embodiment.

DESCRIPTION OF REFERENCE NUMERALS

-   1, 2: Solid state imaging device -   10, 10A, 10B: Photodetecting section -   20, 20A, 20B: Signal readout section -   30: Controlling section -   40: Correction processing section -   P_(1,1) to P_(M,N): Pixel portion -   PD: Photodiode -   SW₁: Readout switch -   S₁ to S_(N): Integration circuit -   C₂: Integrating capacitive element -   SW₂: Discharge switch -   A₂: Amplifier -   H₁ to H_(N): Holding circuit -   C₃: Holding capacitive element -   SW₃₁: Input switch -   SW₃₂: Output switch -   L_(V,m): m-th row selection wiring -   L_(H,n): n-th column selection wiring -   L_(O,n): n-th column readout wiring -   L_(R): Discharge wiring -   L_(H): Holding wiring -   L_(out): Voltage output wiring

BEST MODES FOR CARRYING OUT THE INVENTION

Hereinafter, a best mode for carrying out the present invention will be described with reference to the accompanying drawings. In the description of the drawings, the same components will be designated with the same reference numerals, and overlapping description will be omitted.

FIG. 1 is a schematic configuration view of a solid state imaging device 1 of the present embodiment. The solid state imaging device 1 of the present embodiment includes a photodetecting section 10, a signal readout section 20, a controlling section 30, and a correction processing section 40. When it is used as an X-ray flat panel, a scintillator panel is overlaid on the photodetecting section 10 of the solid state imaging device 1.

The photodetecting section 10 includes M×N pixel portions P_(1,1) to P_(M,N) two-dimensionally arrayed in M rows and N columns. A pixel portion P_(m,n) is positioned on the m-th row in the n-th column. Here, M and N are integers not less than 2, and m is integers not less than 1 and not more than M, and n is integers not less than 1 and not more than N. The pixel portions P_(m,n) are a PPS type, and have a common configuration.

N pixel portions P_(m,1) to P_(m,N) of the m-th row are connected to the controlling section 30 by an m-th row selection wiring L_(v,m). Output terminals of M pixel portions P_(1,n) to P_(M,n) of the n-th column are connected to an integration circuit S_(n) included in the signal readout section 20 by an n-th column readout wiring L_(O,n).

The signal readout section 20 includes N integration circuits S₁ to S_(N) and N holding circuits H₁ to H_(N). The integration circuits S_(n) have a common configuration. The holding circuits H_(n) have a common configuration.

Each integration circuit S_(n) has an input terminal connected to the readout wiring L_(O,n), and accumulates charges input in this input terminal and outputs a voltage value corresponding to the accumulated charge amount from an output terminal to the holding circuit H_(n). N integration circuits S₁ to S_(N) are connected to the controlling section 30 by a discharge wiring L_(R).

Each holding circuit H_(n) has an input terminal connected to the output terminal of the integration circuit S_(n), and holds a voltage value input in this input terminal and outputs the held voltage value from an output terminal to the output wiring L_(out). N holding circuits H₁ to H_(N) are connected to the controlling section 30 by a holding wiring L_(H). Each holding circuit H_(n) is connected to the controlling section 30 by an n-th column selection wiring L_(H,n).

The controlling section 30 outputs an m-th row selecting control signal Vsel(m) to an m-th row selection wiring L_(V,m) to supply this m-th row selecting control signal Vsel(m) to N pixel portions P_(m,1) to P_(m,N) of the m-th row. M row selecting control signals Vsel(1) to Vsel(M) are successively set to significant values. The controlling section 30 includes a shift register for successively setting the M row selecting control signals Vsel(1) to Vsel(M) to significant values and outputting them.

The controlling section 30 outputs an n-th column selecting control signal Hsel(n) to an n-th column selection wiring L_(H,n) to supply this n-th column selecting control signal Hsel(n) to the holding circuit H_(n). N column selecting control signals Hsel(1) to Hsel(N) are also successively set to significant values. The controlling section 30 includes a shift register for successively setting the N column selecting control signals Hsel(1) to Hsel(N) to significant values and outputting them.

The controlling section 30 outputs a discharging control signal Reset to the discharge wiring L_(R) to supply this discharging control signal Reset to the N integration circuits S₁ to S_(N). The controlling section 30 outputs a holding control signal Hold to the holding wiring L_(H) to supply this holding control signal Hold to the N holding circuits H₁ to H_(N).

As described above, the controlling section 30 controls opening and closing operations of readout switches SW₁ included in N pixel portions P_(m,1) to P_(m,N) of the m-th row in the photodetecting section 10, and controls voltage value holding operations and output operations in the signal readout section 20. Accordingly, the controlling section 30 makes the signal readout section 20 repeatedly output voltage values corresponding to amounts of charges generated in photodiodes PD included in M×N pixel portions P_(1,1) to P_(M,N) in the photodetecting section 10 as frame data.

The correction processing section 40 acquires respective frame data repeatedly output from the signal readout section 20 and applies correction processing thereto, and outputs frame data after being subjected to correction processing. The details of the correction processing in the correction processing section 40 will be described in detail later.

FIG. 2 is a circuit diagram of a pixel portion P_(m,n), an integration circuit S_(n), and a holding circuit H_(n) included in the solid state imaging device 1 of the present embodiment. Here, a circuit diagram of a pixel portion P_(m,n) as a representative of the M×N pixel portions P_(1,1) to P_(M,N) is shown, a circuit diagram of an integration circuit S_(n) as a representative of the N integration circuits S₁ to S_(N) is shown, and a circuit diagram of a holding circuit H_(n) as a representative of the N holding circuits H₁ to H_(N) is shown. That is, circuit portions concerning a pixel portion P_(m,n) on the m-th row in the n-th column and the n-th column readout wiring L_(O,n) are shown.

The pixel portion P_(m,n) includes a photodiode PD and a readout switch SW₁. The anode terminal of the photodiode PD is grounded, and the cathode terminal of the photodiode PD is connected to the n-th column readout wiring L_(O,n) via the readout switch SW₁. The photodiode PD generates charges as much as incident light intensity, and accumulates the generated charges in a junction capacitance portion. The readout switch SW₁ is supplied with an m-th row selecting control signal which passed through the m-th row selection wiring L_(V,m) from the controlling section 30. The m-th row selecting control signal instructs opening and closing operations of the readout switches SW₁ included in N pixel portions P_(m,1) to P_(m,N) of the m-th row in the photodetecting section 10.

In this pixel portion P_(m,n), when the m-th row selecting control signal Vsel(m) is at low level, the readout switch SW₁ opens, and charges generated in the photodiode PD are not output to the n-th column readout wiring L_(O,n) but are accumulated in the junction capacitance portion. On the other hand, when the m-th row selecting control signal Vsel(m) is at high level, the readout switch SW₁ closes, and charges generated in the photodiode PD and accumulated in the junction capacitance portion until then are output to the n-th column readout wiring L_(O,n) through the readout switch SW₁.

The n-th column readout wiring L_(O,n) is connected to the readout switches SW₁ included in M pixel portions P_(1,n) to P_(M,n) of the n-th column in the photodetecting section 10. The n-th column readout wiring L_(O,n) reads out charges generated in the photodiode PD included in any of the M pixel portions P_(1,n) to P_(M,n) via the readout switch SW₁ included in the pixel portion, and transfers the charges to the integration circuit S_(n).

The integration circuit S_(n) includes an amplifier A₂, an integrating capacitive element C₂, and a discharge switch SW₂. The integrating capacitive element C₂ and the discharge switch SW₂ are connected in parallel to each other, and provided between an input terminal and an output terminal of the amplifier A₂. The input terminal of the amplifier A₂ is connected to the n-th column readout wiring L_(O,n). The discharge switch SW₂ is supplied with a discharging control signal Reset which passed through the discharge wiring L_(R) from the controlling section 30. The discharging control signal Reset instructs opening and closing operations of the discharge switches SW₂ included in N integration circuits S₁ to S_(N).

In this integration circuit S_(n), when the discharging control signal Reset is at high level, the discharge switch SW₂ closes and the integrating capacitive element C₂ is discharged, and a voltage value to be output from the integration circuit S_(n) is initialized. When the discharging control signal Reset is at low level, the discharge switch SW₂ opens, and charges input in the input terminal are accumulated in the integrating capacitive element C₂, and a voltage value corresponding to the accumulated charge amount is output from the integration circuit S_(n).

The holding circuit H_(n) includes an input switch SW₃₁, an output switch SW₃₂, and a holding capacitive element C₃. One end of the holding capacitive element C₃ is grounded. The other end of the holding capacitive element C₃ is connected to the output terminal of the integration circuit S_(n) via the input switch SW₃₁, and connected to the voltage output wiring L_(out) via the output switch SW₃₂. The input switch SW₃₁ is supplied with a holding control signal Hold which passed through the holding wiring L_(H) from the controlling section 30. The holding control signal Hold instructs opening and closing operations of input switches SW₃₁ included in the N holding circuits H₁ to H_(N). The output switch SW₃₂ is supplied with an n-th column selecting control signal Hsel(n) which passed through the n-th column selection wiring L_(H,n) from the controlling section 30. The n-th column selecting control signal Hsel(n) instructs opening and closing operations of the output switch SW₃₂ included in the holding circuit H_(n).

In this holding circuit H_(n), when the holding control signal Hold switches from high level to low level, the input switch SW₃₁ switches from a closed state to an open state, and a voltage value input in the input terminal at this time is held by the holding capacitive element C₃. When the n-th column selecting control signal Hsel(n) is at high level, the output switch SW₃₂ closes and the voltage value held by the holding capacitive element C₃ is output to the voltage output wiring L_(out).

When outputting voltage values corresponding to received light intensities received by the N pixel portions P_(m,1) to P_(m,N) of the m-th row in the photodetecting section 10, the controlling section 30 instructs temporary closing and then opening of discharge switches SW₂ included in the N integration circuits S₁ to S_(N) by the discharging control signal Reset, and then instructs closing of the readout switches SW₁ included in the N pixel portions P_(m,1) to P_(m,N) of the m-th row in the photodetecting section 10 for a predetermined period by an m-th row selecting control signal Vsel(m). The controlling section 30 instructs switching of the input switches SW₃₁ included in the N holding circuits H₁ to H_(N) from a closed state to an open state by a holding control signal Hold in the predetermined period. Then, after the predetermined period, the controlling section 30 instructs successive closing of the output switches SW₃₂ included in the N holding circuits H₁ to H_(N) for a predetermined period by column selecting control signals Hsel(1) to Hsel(N). The controlling section 30 performs the above-described control for the rows in order.

Next, operations of the solid state imaging device 1 of the present embodiment will be described. In the solid state imaging device 1 of the present embodiment, under control by the controlling section 30, according to level changes of the M row selecting control signals Vsel(1) to Vsel(M), the N column selecting control signals Hsel(1) to Hsel(N), the discharging control signal Reset, and the holding control signal Hold at predetermined timings, light made incident on the photodetecting section 10 can be imaged and frame data can be obtained, and the frame data can be corrected by the correction processing section 40.

FIG. 3 is a timing chart describing operations of the solid state imaging device 1 of the present embodiment. This figure shows, in order from the top, (a) the discharging control signal Reset for instructing opening and closing operations of the discharge switches SW₂ included in N integration circuits S₁ to S_(N), (b) the first row selecting control signal Vsel(1) for instructing opening and closing operations of the readout switches SW₁ included in the N pixel portions P_(1,1) to P_(1,N) of the first row in the photodetecting section 10, (c) the second row selecting control signal Vsel(2) for instructing opening and closing operations of the readout switches SW₁ included in the N pixel portions P_(2,1) to P_(2,N) of the second row in the photodetecting section 10, and (d) the holding control signal Hold for instructing opening and closing operations of the input switches SW₃₁ included in the N holding circuits H₁ to H_(N).

This figure further shows, subsequently in order, (e) the first column selecting control signal Hsel(1) for instructing opening and closing operations of the output switch SW₃₂ included in the holding circuit H₁, (f) the second column selecting control signal Hsel(2) for instructing opening and closing operations of the output switch SW₃₂ included in the holding circuit H₂, (g) the third column selecting control signal Hsel(3) for instructing opening and closing operations of the output switch SW₃₂ included in the holding circuit H₃, (h) the n-th column selecting control signal Hsel(n) for instructing opening and closing operations of the output switch SW₃₂ included in the holding circuit H_(n), and (i) the N-th column selecting control signal Hsel(N) for instructing opening and closing operations of the output switch SW₃₂ included in the holding circuit H_(N).

Charges generated in the photodiodes PD included in the N pixel portions P_(1,1) to P_(1,N) of the first row and accumulated in the junction capacitance portions are read out as follows. Before the time t₁₀, the M row selecting control signals Vsel(1) to Vsel(M), N column selecting control signals Hsel(1) to Hsel(N), the discharging control signal Reset, and the holding control signal Hold are at low level.

During the period from the time t₁₀ to the time t₁₁, the discharging control signal Reset to be output from the controlling section 30 to the discharge wiring L_(R) becomes high level, and accordingly, in the N integration circuits S₁ to S_(N), the discharge switches SW₂ close and the integrating capacitive elements C₂ are discharged. During the period from the time t₁₂ after the time t₁₁ to the time t₁₅, the first row selecting control signal Vsel(1) to be output from the controlling section 30 to the first row selection wiring L_(V,1) becomes high level, and accordingly, the readout switches SW₁ included in the N pixel portions P_(1,1) to P_(1,N) of the first row in the photodetecting section 10 close.

In this period (t₁₂ to t₁₅), during the period from the time t₁₃ to the time t₁₄, the holding control signal Hold to be output from the controlling section 30 to the holding wiring L_(H) becomes high level, and accordingly, input switches SW₃₁ in the N holding circuits H₁ to H_(N) close.

In the period (t₁₂ to t₁₅), the readout switch SW₁ included in each pixel portion P_(1,n) of the first row is closed and the discharge switch SW₂ of each integration circuit S_(n) is open, so that charges generated in the photodiode PD of each pixel portion P_(1,n) and accumulated in the junction capacitance portion until then are transferred to and accumulated in the integrating capacitive element C₂ of the integration circuit S_(n) through the readout switch SW₁ of the pixel portion P_(1,n) and the n-th column readout wiring L_(O,n). Then, a voltage value corresponding to the amount of charges accumulated in the integrating capacitive element C₂ of each integration circuit S_(n) is output from the output terminal of the integration circuit S_(n).

At the time t₁₄ in the period (t₁₂ to t₁₅), the holding control signal Hold switches from high level to low level, and accordingly, in each of the N holding circuits H₁ to H_(N), the input switch SW₃₁ switches from a closed state to an open state, and the voltage value output from the output terminal of the integration circuit S_(n) and input in the input terminal of the holding circuit H_(n) is held by the holding capacitive element C₃.

Then, after the period (t₁₂ to t₁₅), the column selecting control signals Hsel(1) to Hsel(N) to be output from the controlling section 30 to the column selection wirings L_(H,1) to L_(H,N) successively become high level for a predetermined period, and accordingly, the output switches SW₃₂ included in the N holding circuits H₁ to H_(N) successively close for the predetermined period, and voltage values held by the holding capacitive elements C₃ of the respective holding circuits H_(n) are successively output to the voltage output wiring L_(out) through the output switches SW₃₂. These voltage values V_(out) to be output to the voltage output wiring L_(out) indicate the received light intensities received by the photodiodes PD included in the N pixel portions P_(1,1) to P_(1,N) of the first row. The voltage values V_(out) output from the N holding circuits H₁ to H_(N) to the voltage output wiring L_(out) are input into the correction processing section 40 through the voltage output wiring L_(out).

Subsequently, charges generated in the photodiodes PD included in the N pixel portions P_(2,1) to P_(2,N) of the second row and accumulated in the junction capacitance portions are read out as follows.

During the period from the time t₂₀ to the time t₂₁, the discharging control signal Reset to be output from the controlling section 30 to the discharge wiring L_(R) becomes high level, and accordingly, in the N integration circuits S₁ to S_(N), the discharge switches SW₂ close and the integrating capacitive elements C₂ are discharged. During the period from the time t₂₂ after the time t₂₁ to the time t₂₅, the second row selecting control signal Vsel(2) to be output from the controlling section 30 to the second row selection wiring L_(V,2) becomes high level, and accordingly, the readout switches SW₁ included in the N pixel portions P_(2,1) to P_(2,N) of the second row in the photodetecting section 10 close.

In this period (t₂₂ to t₂₅), during the period from the time t₂₃ to the time t₂₄, the holding control signal Hold to be output from the controlling section 30 to the holding wiring L_(H) becomes high level, and accordingly, in the N holding circuits H₁ to H_(N), the input switches SW₃₁ close.

Then, after the period (t₂₂ to t₂₅), the column selecting control signals Hsel(1) to Hsel(N) to be output from the controlling section 30 to the column selection wirings L_(H,1) to L_(H,N) successively become high level for a predetermined period, and accordingly, the output switches SW₃₂ included in the N holding circuits H₁ to H_(N) successively close for the predetermined period.

Thus, voltage values V_(out) indicating received light intensities received by the photodiodes PD included in the N pixel portions P_(2,1) to P_(2,N) of the second row are output to the voltage output wiring L_(out). The voltage values V_(out) output from the N holding circuits H₁ to H_(N) to the voltage output wiring L_(out) are input into the correction processing section 40 through the voltage output wiring L_(out).

Continuously from the operations for the first row and the second row described above, the same operations are performed for the third to M-th rows, and frame data indicating an image which is obtained by one imaging is obtained. When the operations for the M-th row are finished, the same operations are performed again in order from the first row, and frame data indicating a next image is obtained. By thus repeating the same operations with a predetermined period, voltage values V_(out) indicating two-dimensional intensity distribution of the image of light received by the photodetecting section 10 are output to the voltage output wiring L_(out), and frame data is repeatedly obtained. These frame data are input into the correction processing section 40.

Charges generated in the photodiode PD of each pixel portion P_(m,n) of the m-th row and accumulated in the junction capacitance portion during the period of closing of the readout switches SW₁ included in the N pixel portions P_(m,1) to P_(m,N) of the m-th row are transferred to the integrating capacitive element C₂ of the integration circuit S_(n) through the readout switch SW₁ of the pixel portion P_(m,n) and the n-th column readout wiring L_(O,n). At this time, the accumulated charges in the junction capacitance portion of the photodiode PD of each pixel portion P_(m,n) of the m-th row are initialized.

However, when a certain n-th column readout wiring L_(O,n) is broken at a point halfway, pixel portions farther from the integration circuit S_(n) than the broken point among the M pixel portions P_(1,n) to P_(M,n) of the n-th column are not connected to the integration circuit S_(n), and cannot transfer charges to the integration circuit S_(n), so that initialization of the accumulated charges in the junction capacitance portions of the photodiodes PD by this charge transfer is impossible. If this goes on, charges generated in the photodiodes in response to light incidence on these pixel portions are just accumulated in the junction capacitance portions of the photodiodes, and if the accumulated charges exceed a saturation level, the charges overflow to pixel portions in neighboring columns on both sides, and defective lines occur with pixel portions in three consecutive columns.

Therefore, in the solid state imaging device 1 of the present embodiment, the correction processing section 40 acquires respective frame data repeatedly output from the signal readout section 20 and applies the following correction processing to the frame data.

Hereinafter, it is assumed that any readout wiring L_(O,n1) of the n1-th column among the readout wirings L_(O,1) to L_(O,N) is broken. Then, a pixel portion on a defective line which is not connected to the signal readout section 20 due to the breakage of the readout wiring L_(O,n1) among the M pixel portions P_(1,n1) to P_(M,n1) of the n1-th column is defined as a pixel portion P_(m1,n1). A pixel portion on a neighboring line neighboring the pixel portion P_(m1,n1) in the n2-th column neighboring the n1-th column is defined as a pixel portion P_(m1,n2). Here, m1 is an integer not less than 1 and not more than M, n1 and n2 are integers not less than 1 and not more than N, and a difference between n1 and n2 is 1.

The correction processing section 40 corrects a voltage value corresponding to a pixel portion P_(m1,n2) in frame data output from the signal readout section 20 by converting the voltage value according to a relational expression containing the voltage value as an input variable. At this time, the correction processing section 40 can use an arbitrary relational expression as the above-described relational expression, however, conveniently, the correction processing section 40 uses a polynomial. The correction processing section 40 can use values determined based on incident light intensity dependencies of voltage values corresponding to a pixel portion which is neither a pixel portion P_(m1,n1) nor a pixel portion P_(m1,n2) and incident light intensity dependencies of voltage values corresponding to the pixel portion P_(m1,n2) as coefficients of the polynomial.

It is also preferable that the correction processing section 40 corrects a voltage value corresponding to a pixel portion P_(m1,n2) in frame data by setting the coefficients for each of any plurality of readout wirings among the readout wirings L_(O,1) to L_(O,N) when the plurality of readout wirings are broken.

Further, the correction processing section 40 determines a voltage value corresponding to the pixel portion P_(m1,n1) on the defective line in the frame data based on a value after being corrected of a voltage value corresponding to the pixel portion P_(m1,n2) on the neighboring line. Preferably, this determination is made by interpolation based on voltage values corresponding to pixel portions P_(m1,n2) on neighboring lines on both sides of the detective line. For example, it is also possible that an average of the voltage values corresponding to the pixel portions P_(m1,n2) on the neighboring lines on both sides is obtained.

The correction processing section 40 outputs frame data in which voltage values corresponding to the pixel portions P_(m1,n2) on the neighboring lines and the pixel portion P_(m1,n1) on the defective line were corrected as described above.

Correction processing for the voltage value corresponding to the pixel portion P_(m1,n2) on the neighboring line is described in detail as follows.

FIG. 4 is a diagram showing the relationship between voltage values corresponding to pixel portions on a normal line and a neighboring line in frame data output from the signal readout section 20. Here, light with uniform intensity is made incident on the entire photodetecting section 10, and by changing this incident light intensity, the relationship between a voltage value V₁ corresponding to a pixel portion on the neighboring line and a voltage value V₂ corresponding to the pixel portion on the normal line is obtained and shown by a solid line in the figure. In the figure, the line of “V₂=V₁” is shown by a dashed line. These voltage values V₁ and V₂ are after dark calibration. The normal line is neither a defective line the readout wiring of which is broken, nor a neighboring line into which charges flow from a pixel portion on the defective line.

As shown in this figure, the voltage value V₂ corresponding to the pixel portion on the normal line is expressed in general by a function containing the voltage value V₁ corresponding to the pixel portion on the neighboring line as an input variable as shown in Numerical formula (1) given below. Conveniently, as shown in Numerical formula (2) given below, the voltage value V₂ corresponding to the pixel portion on the normal line is expressed by, for example, a quartic polynomial containing the voltage value V₁ corresponding to the pixel portion on the neighboring line as an input variable.

In FIG. 4, light with uniform intensity is made incident on the entire photodetecting section 10, so that the voltage value V₁ corresponding to the pixel portion on the neighboring line should become equal to the voltage value V₂ corresponding to the pixel portion on the normal line unless flowing-in, etc., of charges from the pixel portion on the defective line occur, however, due to the flowing-in of charges from the pixel portion of the defective line, the voltage value V₁ becomes different from the voltage value V₂.

Here, Numerical formula (1) is defined as an expression which relates a voltage value V₁ corresponding to a pixel portion on a neighboring line and a voltage value V₂ corresponding to a pixel portion on a normal line when light with uniform intensity is made incident on the photodetecting section. In detail, for Numerical formula (2) which is a polynomial, coefficients a to e are determined at the time of inspection of the product. Specifically, when the voltage value V₁ is obtained in the pixel portion on the neighboring line, V₂ is obtained by substituting V₁ into the Numerical formula (2). Numerical formulas (1) and (2) are expressions showing the relationship between voltage values output from pixel portions on the neighboring line and the normal line when light with uniform intensity is irradiated, and Numerical formula (3) is defined as an expression for obtaining a correction value V₁′ from the voltage value V₁ of the pixel portion on the neighboring line.

In detail, as shown in FIG. 4, the value V₂ which is obtained according to Numerical formula (1) (in detail, Numerical formula (2) with determined coefficients) when the voltage value corresponding to the pixel portion on the neighboring line is V₁ becomes the value of the voltage value V₁ corresponding to the pixel portion on the neighboring line when flowing-in, etc., of charges from the pixel portion on the defective line does not occur, and this is used as a correction value (V₁′).

That is, Numerical formulas (1) and (2) are considered as expressions which relate the voltage value of the neighboring line to the voltage value of the normal line, and the voltage value of the normal line is obtained from the voltage value of the neighboring line and is set as the voltage value of the neighboring line when flowing-in, etc., of charges from the pixel portion on the defective line does not occur. V ₂ =f(V ₁)  (1) V ₂ =aV ₁ ⁴ +bV ₁ ³ +cV ₁ ² +dV ₁ +e  (2)

Thus, the voltage value V₁ corresponding to the pixel portion P_(m1,n2) on the neighboring line in frame data output from the signal readout section 20 is corrected by being converted according to the polynomial of Numerical formula (3) given below which contains the voltage value as an input variable. The correction processing section 40 determines the voltage value corresponding to the pixel portion P_(m1,n1) on the defective line based on the voltage value V₁′ after being corrected. V ₁ ′=aV ₁ ⁴ +bV ₁ ³ +cV ₁ ² +dV ₁ +e  (3)

Preferably, the correction processing section 40 applies dark calibration to the voltage values corresponding to pixel portions in frame data output from the signal readout section 20 before performing the above-described processing. The correction processing section 40 may use analog processing to perform the above-described processing, however, preferably, it performs digital processing after digital-converting the frame data output from the signal readout section 20, and preferably includes frame memories for storing frame data as digital values.

Preferably, to perform the above-described processing, the correction processing section 40 includes a storage section which stores data on a broken readout wiring among the readout wirings L_(O,1) to L_(O,N) and a broken point of the broken readout wiring in advance. Further, preferably, wire breakage information obtained in inspection in the middle of or after production of the solid state imaging device 1 is stored in the storage section from the outside.

The correction processing section 40 may be provided integrally with the photodetecting section 10, the signal readout section 20, and the controlling section 30. In this case, preferably, the entire solid state imaging device 1 is integrated on a semiconductor substrate. The photodetecting section 10, the signal readout section 20, and the controlling section 30 are integrated, however, the correction processing section 40 may be provided separately. In this case, the correction processing section 40 can be realized by, for example, a computer.

As described above, in the solid state imaging device 1 of the present embodiment or the method for correcting frame data output from the signal readout section 20 of the solid state imaging device 1, the voltage value corresponding to the pixel portion P_(m1,n2) on the neighboring line in the frame data is corrected according to the relational expression. That is, when correcting the voltage value corresponding to the pixel portion P_(m1,n2) on the neighboring line, it is not necessary to use a voltage value corresponding to a pixel portion on a normal line. Therefore, in the present invention, the resolution near the defective line in the corrected image becomes higher than in the invention described in Patent Document 1.

The frame data output operation by the signal readout section 20 and the correction processing by the correction processing section 40 may be performed alternately, or performed in parallel. In the former case, after an operation for outputting the frame data F_(k) by the signal readout section 20, correction processing for the frame data F_(k) by the correction processing section 40 is performed, and after the correction processing is finished, the next frame data F_(k+1) is output from the signal readout section 20 to the correction processing section 40. On the other hand, in the latter case, after the operation for outputting the frame data F_(k) by the signal readout section 20, the correction processing for the frame data F_(k) by the correction processing section 40 is performed, and in a period at least a part of which overlaps the period of the correction processing, the next frame data F_(k+1) is output from the signal readout section 20 to the correction processing section 40.

The leakage of charges from a pixel portion on a defective line to a pixel portion on a neighboring line occurs so that the charges leak to pixel portions on neighboring lines on both sides of the defective line. Therefore, preferably, the pixel portions on neighboring lines on both sides of the defective line are corrected by using voltage values of previous frame data. However, in a case where a voltage value of a pixel portion on a neighboring line on one side of the defective line and a voltage value of a pixel portion on a normal line further neighboring the neighboring line on the same side are binned (summed) and read out, the correction using the voltage values of the previous frame data is applied to only the voltage value of the pixel portion on the neighboring line on the other side of the defective line. Even in this case, a resolution higher than in the invention described in Patent Document 1 is obtained.

Next, another embodiment of the solid state imaging device of the present invention will be described. FIG. 5 is a configuration view of a solid state imaging device 2 of another embodiment. This solid state imaging device 2 includes photodetecting sections 10A and 10B, signal readout sections 20A and 20B, a controlling section 30, a correction processing section 40, and buffer sections 50A and 50B. When it is used as an X-ray flat panel, a scintillator panel is overlaid on the photodetecting sections 10A and 10B of the solid state imaging device 2.

The photodetecting sections 10A and 10B included in the solid state imaging device 2 are similar to the photodetecting section 10 included in the solid state imaging device 1. The signal readout sections 20A and 20B included in the solid state imaging device 2 are similar to the signal readout section 20 included in the solid state imaging device 1.

The controlling section 30 included in the solid state imaging device 2 outputs an m-th row selecting control signal Vsel(m) to the m-th row selection wiring L_(V,m) to supply this m-th row selecting control signal Vsel(m) to the pixel portions P_(m,1) to P_(m,N) of the m-th rows included in the photodetecting sections 10A and 10B. The controlling section 30 outputs an n-th column selecting control signal Hsel(n) which should be supplied to each holding circuit H_(n) included in the signal readout section 20A to the n-th column selection wiring L_(HA,n), and outputs an n-th column selecting control signal Hsel(n) which should be supplied to each holding circuit H_(n) included in the signal readout section 20B to the n-th column selection wiring L_(HB,n).

The controlling section 30 outputs a discharging control signal Reset which should be supplied to the respective integration circuits S_(n) included in the signal readout sections 20A and 20B to the discharge wiring L_(R). The controlling section 30 outputs a holding control signal Hold which should be supplied to the respective holding circuits H_(n) included in the signal readout sections 20A and 20B to the holding wiring L_(H).

As described above, the controlling section 30 controls opening and closing operations of the readout switches SW₁ included in N pixel portions P_(m,1) to P_(m,N) of the m-th rows included in the photodetecting sections 10A and 10B, and controls voltage value holding operations and output operations in the signal readout sections 20A and 20B. Accordingly, the controlling section 30 makes the signal readout sections 20A and 20B repeatedly output voltage values corresponding to amounts of charges generated in the photodiodes PD included in M×N pixel portions P_(1,1) to P_(M,N) in the photodetecting sections 10A and 10B as frame data.

Thus, the solid state imaging device 2 includes a plurality of pairs of photodetecting sections and signal readout sections, and accordingly, the solid state imaging device 2 can expand the photodetecting region, or increase the number of pixels. The plurality of signal readout sections can be operated in parallel to each other, and high-speed reading out of pixel data is possible.

The buffer sections serve as signal output sections for transmitting signals from the plurality of pairs of photodetecting sections and signal readout sections to the correction processing section, respectively. The pairs of photodetecting sections and signal readout sections can be formed on semiconductor substrates different from each other, and in this case, the correction processing section can be formed on any semiconductor substrate on which the photodetecting section and the signal readout section are formed, or still another semiconductor substrate. The buffer section may consist of only a buffer amplifier.

The correction processing section 40 inputs voltage values which were successively output from the holding circuits H_(n) included in the signal readout section 20A to the voltage output wiring L_(out) _(—) _(A) and passed through the buffer section 50A, and inputs voltage values which were successively output from the holding circuits H_(n) included in the signal readout section 20B to the voltage output wiring L_(out) _(—) _(B) and passed through the buffer section 50B. Then, the correction processing section 40 acquires frame data repeatedly output from the signal readout sections 20A and 20B and applies correction processing thereto, and outputs frame data after being subjected to the correction processing.

The details of processing in this correction processing section 40 are as described above. However, the operation characteristics of the buffer section 50A and the buffer section 50B are not always equal to each other, and even when their input voltage values are the same, their output voltage values are different in some cases. Therefore, when a readout wiring of any of the columns included in the photodetecting section 20A is broken, it is preferable that coefficients a to e determined based on incident light intensity dependencies of voltage values corresponding to a pixel portion (normal line) which is neither a pixel portion P_(m1,n1) nor a pixel portion P_(m1,n2) included in the photodetecting section 20A and incident light intensity dependencies of voltage values corresponding to the pixel portion P_(m1,n2) (neighboring line) are used.

Similarly, in the correction processing section 40, when a readout wiring of any of the columns included in the photodetecting section 20B is broken, it is preferable that coefficients a to e determined based on incident light intensity dependencies of voltage values corresponding to a pixel portion (normal line) which is neither a pixel portion P_(m1,n1) nor a pixel portion P_(m1,n2) included in the photodetecting section 20B and incident light intensity dependencies of voltage values corresponding to the pixel portion P_(m1,n2) (neighboring line) are used.

The solid state imaging device 1 of the present embodiment or the method for correcting frame data output from the signal readout section 20 of the solid state imaging device 1 is preferably used in an X-ray CT device. An embodiment of an X-ray CT device including the solid state imaging device 1 of the present embodiment will be described next.

FIG. 6 is a configuration view of an X-ray CT device 100 of the present embodiment. In the X-ray CT device 100 shown in this figure, an X-ray source (X-ray output section) 106 generates X-rays toward a subject. The irradiation field of the X-ray generated from the X-ray source 106 is controlled by a primary slit plate 106 b. The X-ray source 106 includes an X-ray tube installed inside, and by adjusting the conditions such as a tube voltage, a tube current, and an energization time of the X-ray tube, the X-ray irradiation amount onto the subject is controlled. An X-ray imager 107 includes a CMOS solid state imaging device having a plurality of pixel portions two-dimensionally arrayed, and detects an X-ray image which passed through the subject. In front of the X-ray imager 107, a secondary slit plate 107 a which limits an X-ray incidence region is provided.

A swiveling arm 104 holds the X-ray source 106 and the X-ray imager 107 opposite to each other and swivels these around a subject when performing panoramic tomography. A slide mechanism 113 for linearly displacing the X-ray imager 107 with respect to a subject when performing linear tomography is provided. The swiveling arm 104 is driven by an arm motor 110 constituting a rotary table, and the rotation angle is detected by an angle sensor 112. The arm motor 110 is loaded on a movable portion of an XY table 114, and the rotation center is arbitrarily adjusted within the horizontal plane. The arm motor 110 and the XY table constitute a rotary drive unit 103. Thus, the solid state imaging device 1 or 2 installed inside the X-ray source 106 and the X-ray imager 107 is moved relative to a subject by various moving means 104, 110, 114, and 113.

An image signal output from the X-ray imager 107 is converted into digital data of, for example, 10 bits (=1024 level) by an AD converter 120, and temporarily taken into a CPU (Central Processing Unit) 121, and then stored in a frame memory 122. From the image data stored in the frame memory 122, a tomographic image along an arbitrary tomographic surface is reproduced by predetermined arithmetic processing. The reproduced tomographic image is output to a video memory 124, converted into an analog signal by a DA converter 125, and then displayed by an image display section 126 such as a CRT (Cathode-Ray Tube) and used for various diagnoses.

To the CPU 121, a work memory 123 necessary for signal processing is connected, and further, an operation panel 119 including a panel switch and an X-ray irradiation switch, etc., is connected. The CPU 121 is connected to a motor driving circuit 111 which drives the arm motor 110, slit control circuits 115 and 116 which control aperture ranges of the first slit plate 106 b and the second slit plate 107 a, and an X-ray control circuit 118 which controls the X-ray source 106, and further, outputs a clock signal for driving the X-ray imager 107.

The X-ray control circuit 118 can feedback-control the X-ray irradiation amount onto a subject based on a signal imaged by the X-ray imager 107.

In the X-ray CT device 100 configured as described above, the X-ray imager 107 is equivalent to the photodetecting section 10, the signal readout section 20, and the controlling section 30 of the solid state imaging device 1 of the present embodiment, and a scintillator panel is provided on the front surface of the photodetecting section 10. The CPU 121 and the work memory 123 are equivalent to the correction processing section 40 of the solid state imaging device 1 of the present embodiment.

The X-ray CT device 100 includes the solid state imaging device 1 of the present embodiment, and includes the CPU 121 as an image analysis section which generates a tomographic image of a subject based on frame data after being subjected to correction processing output from the solid state imaging device, and accordingly, a tomographic image with high resolution near a defective line can be obtained. Three-dimensional image data can be generated by superimposing the frame data in the thickness direction, and according to a luminance in the frame data, a specific composition color having the luminance can be applied to a pixel having this luminance. Particularly, in the X-ray CT device, a large amount of (for example, 300) frame data is continuously acquired in a short period, and the incident light amount onto the photodetecting section 10 of the solid state imaging device 1 changes by frame, so that the amount of charges which overflow from a pixel portion on a defective line to a pixel portion on a neighboring line changes by frame. In this X-ray CT device, by providing the solid state imaging device 1 of the present invention, effective correction can be applied to frame data. The X-ray CT device 100 may include the solid state imaging device 2 instead of the solid state imaging device 1. 

1. A solid state imaging device of the present invention comprising: a photodetecting section including M×N pixel portions P_(1,1) to P_(M,N) two-dimensionally arrayed in M rows and N columns, each including a photodiode which generates charges as much as incident light intensity and a readout switch which is connected to the photodiode; a readout wiring L_(O,n) which is connected to readout switches included in M pixel portions P_(1,n) to P_(M,n) of the n-th column in the photodetecting section and reads out charges generated in a photodiode included in any of the M pixel portions P_(1,n) to P_(M,n) via the readout switch included in the pixel portion; a signal readout section which is connected to the readout wirings L_(O,1) to L_(O,N), holds voltage values corresponding to the amounts of charges input through the readout wirings L_(O,n), and successively outputs the held voltage values; a controlling section which controls opening and closing operations of readout switches included in N pixel portions P_(m,1) to P_(m,N) of the m-th row in the photodetecting section, controls voltage value output operations in the signal readout section, and makes the signal readout section repeatedly output voltage values corresponding to the amounts of charges generated in the photodiodes included in the M×N pixel portions P_(1,1) to P_(M,N) in the photodetecting section as frame data; and a correction processing section which acquires respective frame data repeatedly output from the signal readout section and applies correction processing thereto, where M and N are integers not less than 2, m is integers not less than 1 and not more than M, n is integers not less than 1 and not more than N, m1 is an integer not less than 1 and not more than M, and n1 and n2 are integers not less than 1 and not more than N, wherein when any readout wiring L_(O,n1) of the n1-th column among the readout wirings L_(O,1) to L_(O,N) is broken, the correction processing section: defines a pixel portion which is not connected to the signal readout section due to the breakage of the readout wiring L_(O,n1) as a pixel portion P_(m1,n1) among M pixel portions P_(1,n1) to P_(M,n1) of the n1-th column, and defines a pixel portion neighboring the pixel portion P_(m1,n1) in the n2-th column neighboring the n1-th column as a pixel portion P_(m1,n2); corrects a voltage value corresponding to the pixel portion P_(m1,n2) in frame data output from the signal readout section by converting the voltage value according to a relational expression containing the voltage value as an input variable; and determines a voltage value corresponding to the pixel portion P_(m1,n1) in the frame data based on the value after being corrected of the voltage value corresponding to the pixel portion P_(m1,n2).
 2. The solid state imaging device according to claim 1, wherein the correction processing section: uses a polynomial as the functional expression; and uses values determined based on incident light intensity dependencies of voltage values corresponding to a pixel portion which is neither the pixel portion P_(m1,n1) nor the pixel portion P_(m1,n2) and incident light intensity dependencies of voltage values corresponding to the pixel portion P_(m1,n2), as coefficients of the polynomial.
 3. The solid state imaging device according to claim 2, wherein the correction processing section corrects a voltage value corresponding to a pixel portion P_(m1,n2) in frame data by setting the coefficients for each of any plurality of readout wirings among the readout wirings L_(O,1) to L_(O,N) when the plurality of readout wirings are broken.
 4. The solid state imaging device according to claim 2, wherein the solid state imaging device comprises a plurality of pairs of photodetecting sections and signal readout sections, and when a readout wiring of any of the columns included in any of the plurality of photodetecting sections is broken, coefficients to be used in the correction processing section are determined based on incident light intensity dependencies of voltage values corresponding to a pixel portion which is neither a pixel portion P_(m1,n1) nor a pixel portion P_(m1,n2) included in the photodetecting section and incident light intensity dependencies of voltage values corresponding to the pixel portion P_(m1,n2).
 5. An X-ray CT device comprising: an X-ray output section which outputs X-rays toward a subject; the solid state imaging device according to claim 1 which receives and images X-rays output from the X-ray output section and reaching through the subject; a moving means for moving the X-ray output section and the solid state imaging device relative to the subject; and an image analysis section which inputs frame data after being corrected, output from the solid state imaging device, and generates a tomographic image of the subject based on the frame data.
 6. A frame data correction method for correcting frame data output from the solid state imaging device which includes: a photodetecting section including M×N pixel portions P_(1,1) to P_(M,N) two-dimensionally arrayed in M rows and N columns, each including a photodiode which generates charges as much as incident light intensity and a readout switch which is connected to the photodiode; a readout wiring L_(O,n) which is connected to readout switches included in M pixel portions P_(1,n) to P_(M,n) of the n-th column in the photodetecting section and reads out charges generated in a photodiode included in any of the M pixel portions P_(1,n) to P_(M,n) via the readout switch included in the pixel portion; a signal readout section which is connected to the readout wirings L_(O,1) to L_(O,N), holds voltage values corresponding to the amounts of charges input through the readout wirings L_(O,n), and successively outputs the held voltage values; a controlling section which controls opening and closing operations of readout switches included in N pixel portions P_(m,1) to P_(m,N) of the m-th row in the photodetecting section, controls voltage value output operations in the signal readout section, and makes the signal readout section repeatedly output voltage values corresponding to the amounts of charges generated in the photodiodes included in the M×N pixel portions P_(1,1) to P_(M,N) in the photodetecting section as frame data, where M and N are integers not less than 2, m is integers not less than 1 and not more than M, n is integers not less than 1 and not more than N, m1 is an integer not less than 1 and not more than M, and n1 and n2 are integers not less than 1 and not more than N, comprising, when any readout wiring L_(O,n1) of the n1-th column among the readout wirings L_(O,1) to L_(O,N) is broken: defining a pixel portion which is not connected to the signal readout section due to the breakage of the readout wiring L_(O,n1) as a pixel portion P_(m1,n1) among M pixel portions P_(1,n1) to P_(M,n1) of the n1-th column, and defining a pixel portion neighboring the pixel portion P_(m1,n1) in the n2-th column neighboring the n1-th column as a pixel portion P_(m1,n2); correcting a voltage value corresponding to the pixel portion P_(m1,n2) in frame data output from the signal readout section by converting the voltage value according to a relational expression containing the voltage value as an input variable; and determining a voltage value corresponding to the pixel portion P_(m1,n1) in the frame data based on the value after being corrected of the voltage value corresponding to the pixel portion P_(m1,n2).
 7. The frame data correction method according to claim 6: using a polynomial as a functional expression; and using values determined based on incident light intensity dependencies of voltage values corresponding to a pixel portion which is neither the pixel portion P_(m1,n1) nor the pixel portion P_(m1,n2) and incident light intensity dependencies of voltage values corresponding to the pixel portion P_(m1,n2), as coefficients of the polynomial.
 8. The frame data correction method according to claim 7: correcting the voltage value corresponding to the pixel portion P_(m1,n2) in the frame data by setting the coefficients for each of any plurality of readout wirings among the readout wirings L_(O,1) to L_(O,N) when the plurality of readout wirings are broken.
 9. The frame data correction method according to claim 7, wherein the solid state imaging device includes a plurality of pairs of photodetecting sections and signal readout sections, and the frame data correction method obtaining the coefficients, when a readout wiring of any of the columns included in any of the plurality of photodetecting sections is broken, based on incident light intensity dependencies of voltage values corresponding to a pixel portion which is neither the pixel portion P_(m1,n1) nor the pixel portion P_(m1,n2) included in the photodetecting section and incident light intensity dependencies of voltage values corresponding to the pixel portion P_(m1,n2). 